Burn-Jeng Lin (Chinese: 林本堅; born 1942) is a Taiwanese engineer.
While working for IBM, Lin became the first to propose immersion lithography, a technique that became viable in the 1980s. Lin left IBM to found his own company, Linnovation, Inc., in 1992. He began working for TSMC in 2000. Lin was named an IEEE Fellow in 2003, and granted an equivalent honor by the SPIE. The next year, SPIE gave Lin the inaugural Frits Zernike Award. In 2008, Lin was elected to membership of the United States National Academy of Engineering "[f]or technical innovations and leadership in the development of lithography for semiconductor manufacturing." Lin received the IEEE Cledo Brunetti Award and IEEE Jun-ichi Nishizawa Medal in 2009 and 2013 respectively. In 2014, Lin was named a member of Academia Sinica. Upon his retirement from TSMC, he was offered a position on the faculty of National Tsing Hua University.
- "ECE Alum Burn Lin receives IEEE Jun-ichi Nishizawa Medal". Ohio State University. 30 April 2013. Retrieved 2 December 2018.
- Burn J. Lin (1987). "The future of subhalf-micrometer optical lithography". Microelectronic Engineering 6, 31–51
- Handy, Jim (26 June 2013). "Father of Immersion Litho Receives Award". Forbes. Retrieved 2 December 2018.
- "Biography: Burn J. Lin". Semiconductor Research Corporation. Retrieved 2 December 2018.
- "Semiconductor Pioneer Burn Lin Joins NTHU". National Tsing Hua University. 2016. Retrieved 2 December 2018.
- "Dr. Burn Jeng Lin". United States National Academy of Engineering. Retrieved 2 December 2018.
- "TSMC Burn Lin Academic Salon". 2016. Retrieved 2 December 2018.